专利名称：Method of parameter creation发明人：Eric Foreman,Ning Lu,Jeffrey Hemmett申请号：US15623549申请日：20170615公开号：US10409938B2公开日：20190910
专利附图：
摘要：According to one embodiment, a method, computer system, and computerprogram product for creating a plurality of process parameters in a circuit design isprovided. The present embodiment of the invention may include receiving one parasiticextraction per layer of a circuit is used to obtain a resistance base factor and a
capacitance base factor. The embodiment may further include performing Monte Carlosimulations to determine distributions of capacitance and resistance for each metal layerof the circuit, and creating scalars that scale each of the resistance base factor and thecapacitance base factor to a minimum and maximum process limit. Additionally, theembodiment may include defining at least one delay corner using the created scalars,and receiving the results of one or more timing analyses performed using the resistancebase factor and the capacitance base factor, and the defined delay corner to determine adelay variability per layer.
申请人：INTERNATIONAL BUSINESS MACHINES CORPORATION
地址：Armonk NY US
国籍：US
代理人：Robert D. Bean
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