Plasma reactor

专利名称：Plasma reactor

发明人：藤崎 純人,内藤 一哉,谷口 昌司,間所 和彦,伊藤 伸

介,河尻 史和,坂井 茂仁

申请号：JP2017015964申请日：20170131公开号：JP6795735B2公开日：20201202

摘要：PROBLEM TO BE SOLVED: To provide a plasma reactor capable of suppressinglowering of insulation resistance between an electrode panel and a reactorbody.SOLUTION: A plurality of electrode panels 13 are held while collectively

surrounded by a holding mat 12. The holding mat 12 is disposed along an inner face of areactor body 11, and has annular end faces 31, 32 respectively at an upstream side and adownstream side in a circulating direction. A surface discharge panel 51 is disposed onthe end face 31 at the upstream side of the holding mat 12. The surface discharge panel51 has a constitution that electrodes 54, 55 are respectively disposed in an annular body52 and on an outer surface 53 of the annular body 52. The electrodes 54, 55 have annularshapes surrounding an outer side of the plurality of electrode panels 13 when observedin the circulating direction.SELECTED DRAWING: Figure 3

申请人：ダイハツ工業株式会社

地址：大阪府池田市ダイハツ町１番１号

国籍：JP

代理人：皆川 祐一

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