专利名称：Manipulation device for precision
adjustments including a double microscopehaving adjustable optical axes
发明人：Karl-Werner Gommel,Uwe Michl,Hans
Radtke
申请号：US05/768669申请日：19770224公开号：US04126376A公开日：19781121
摘要：The invention relates to a manipulation device for precision adjustment of planepattern bearing substrates being provided with two adjustment marks which are atdifferent distances relative to a reference mark, which is, for example, a graduation plate.Such a substrate can be, for example, an intermediate negative or the like which isrequired in the course of a photolithographic mask production of integrated circuits. Themanipulation device is constructed in such a manner that the pattern bearing substrate issubstantially aligned relative to a reference mark by two orthogonal displacements andone rotation. This is accomplished by three displacement members which act upon aslide. Said slide, upon which the pattern bearing substrate is disposed, permitsdisplacements parallel to the plane of the latter. Said displacement members are soarranged that the vectors of the orthogonal displacement actions pass one of the twoadjustment marks.
Therefore, one of the two displacement members is, according to the distancebetween the adjustment marks on the pattern bearing substrate, seated for definite
displacement steps, at right angles to the displacement direction of the substrate.
申请人：JENOPTIK JENA G.M.B.H
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