专利名称：Concentration Measuring Device used in
Manufacturing Process
发明人：Kimihiko ARIMOTO,So TAKAGI申请号：US13861076申请日：20130411
公开号：US20130273670A1公开日：20131017
专利附图：
摘要：A semiconductor manufacturing system comprises a main body that exclusivelyflows a first fluid that is used in a manufacturing process and a second fluid whoseconcentration is known, and that outputs a state signal showing whether or not the fluid
flowing in the flow channel is the second fluid and a concentration measuring devicehaving a concentration measuring part that measures a concentration of a predeterminedcomponent in the fluid flowing in the flow channel, a state signal receiving part thatreceives the state signal from the main body, and a correcting part that obtains areference measurement value as being a measurement value measured by theconcentration measuring part during a period while it is judged that the second fluidflows in the flow channel by the state signal and that corrects the concentrationmeasuring part based on the reference measurement value.
申请人：HORIBA, LTD.
地址：Kyoto-shi JP
国籍：JP
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