Sulfonium salt and chemically amplified positive r

专利名称：Sulfonium salt and chemically amplified

positive resist composition

发明人：Satoshi Watanabe,Youichi Ohsawa,Toshinobu

Ishihara,Kazumasa Maruyama,YoshihumiTakeda,Junji Shimada,Fujio Yagihashi,KatsuyaTakemura

申请号：US08/762861申请日：19961210公开号：US05691112A公开日：19971125

摘要：Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p- tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p- tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resistcomposition which contains the sulfonium salt as a photo- acid generator is highlysensitive to deep-UV rays, electron beams and X- rays, can be developed with alkalineaqueous solution to form a pattern, and is thus suitable for use in a fine patterningtechnique.

申请人：SHIN-ETSU CHEMICAL CO., LTD.

代理机构：Millen, White, Zelano & Branigan, P

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