专利名称：Grid topography for patterned
semiconductor coating that minimizesoptical scatter and obscuration
发明人：William Zmek,Mark Louis Ceccorulli申请号：US14246219申请日：20140407公开号：US09276034B2公开日：20160301
专利附图：
摘要：A surveillance device includes an electronic component and a protective surfaceoutwardly of the electronic component. A generally transparent substrate is formedfrom a first material. Spaced portions of an electrically conductive coating are formedwithin channels in the substrate. The electrically conductive material is a semiconductormaterial. A method is also disclosed.
申请人：Goodrich Corporation
地址：Charlotte NC US
国籍：US
代理机构：Carlson, Gaskey & Olds, PC
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