专利名称：Vitreous silica crucible
发明人：Sudo, Toshiaki,Kishi, Hiroshi,Suzuki, Eriko申请号：EP11191115.2申请日：20111129公开号：EP2458040A3公开日：20120822
摘要：The present invention provides a vitreous silica crucible which can suppressbuckling and sidewall lowering of the crucible without fear of mixing of impurities intosilicon melt. According to the present invention, provided is a vitreous silica crucible forpulling a silicon single crystal, wherein a ratio I2/I1 is 0.67 to 1.17, where I1 and I2 are areaintensities of the peaks at 492 cm and 606 cm, respectively, in Raman spectrum ofvitreous silica of the region having a thickness of 2 mm from an outer surface to an innersurface of a wall of the crucible.
申请人：Japan Super Quartz Corporation
地址：5-14-3 Barajima Akita-shi Akita 010-0065 JP
国籍：JP
代理机构：Gulde Hengelhaupt Ziebig & Schneider
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