专利名称：Composition for removing an insulation
material, method of removing an insulationlayer and method of recycling a substrateusing the same
发明人：Dong-Min Kang,Kui-Jong Baek,Woong
Hahn,Chun-Deuk Lee,Jung-Hun Lim,Young-Nam Kim,Hyun-Joon Kim
申请号：US11540604申请日：20061002公开号：US07851372B2公开日：20101214
专利附图：
摘要：In one aspect, a composition is provided which is capable of removing aninsulation material which includes at least one of a low-k material and a passivationmaterial. The composition of this aspect includes about 5 to about 40 percent by weightof a fluorine compound, about 0.01 to about 20 percent by weight of a first oxidizingagent, about 10 to about 50 percent by weight of a second oxidizing agent, and aremaining water.
申请人：Dong-Min Kang,Kui-Jong Baek,Woong Hahn,Chun-Deuk Lee,Jung-HunLim,Young-Nam Kim,Hyun-Joon Kim
地址：Gyeonggi-do KR,Daejeon KR,Chungcheongnam-do KR,Gyeonggi-do KR,DaejeonKR,Gyeonggi-do KR,Seoul KR
国籍：KR,KR,KR,KR,KR,KR,KR
代理机构：Volentine & Whitt, PLLC
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