专利名称：Coating method for depositing a layer
system on a substrate and substrate havinga layer system
发明人：Jörg Vetter,Georg Erkens,Jürgen Müller申请号：US13865464申请日：20130418公开号：US09551067B2公开日：20170124
专利附图：
摘要：The invention relates to a coating method for depositing a layer system formedfrom hard material layers on a substrate, by depositing at least one contact layer
including the evaporation material on the surface of the substrate only by means of acathodic vacuum arc evaporation source. After the depositing of the contact layer, atleast one intermediate layer is deposited in the form of a nano-layer intermediate layerin a hybrid phase or as a nanocomposite layer, including the evaporation material and thedischarge material, by parallel operation of a cathodic vacuum arc evaporation sourceand of a magnetron discharge source.
申请人：Sulzer Metaplas GmbH
地址：Bergisch Gladbach DE
国籍：DE
代理人：Robert S. Green
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容