专利名称：Porous materials
发明人：Allen, Craig S.,Annan, Nikol,Blankenship,
Robert M.,Gallagher, Michael K.,Gore, RobertH.,Lamola, Angelo A.,You, Yujian
申请号：EP00308660.0申请日：20001002公开号：EP1088848B1公开日：20051228
摘要：Porous dielectric materials having low dielectric constants useful in electroniccomponent manufacture are disclosed along with methods of preparing the porousdielectric materials. Also disclosed are methods of forming integrated circuits containingsuch porous dielectric materials.
申请人：SHIPLEY CO LLC
地址：US
国籍：US
代理机构：Kent, Venetia Katherine
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